Mentor Graphics and Applied Materials Deploy OASIS.MASK Open Data Standard for Higher Efficiency Mask Manufacturing
14 9월 2009 - 10:00PM
Business Wire
Mentor Graphics Corporation (NASDAQ:MENT) and Applied Materials,
Inc. (NASDAQ:AMAT) today announced an important milestone in the
adoption of open data formats for mask manufacturing. The first
volume production deployment of the new OASIS.MASK (SEMI standard
P44) format was performed on Applied’s Aera2™ advanced mask
inspection systems using Mentor Graphics’ mask data preparation
software technology. The new format greatly simplifies the task of
creating the complex, high fidelity photomasks that are vital to
fabricating semiconductor devices at 32nm and below technology
nodes.
OASIS.MASK (Open Artwork System Interchange Standard for
Photomasks) is an open standard interchange format used to
represent and express chip level physical and mask layout data. The
OASIS.MASK format reduces the size of mask data files by
approximately one-half, eliminating the file transfer bottleneck
between software tools and mask manufacturing equipment – a key
benefit with today’s near-terabyte file sizes. As an open
interface, it enables the same data file to be used for pattern
generation, metrology and inspection, simplifying mask
manufacturing process flows by eliminating complex format
conversion steps.
“We are working with Mentor Graphics, a leader in the adoption
of OASIS standards, to improve efficiency up and down the
mask-making value chain by encouraging the adoption of open
standards,” said Tom St. Dennis, senior vice president and general
manager of Applied’s Silicon Systems Group. “By incorporating the
OASIS.MASK format in our Aera2 systems, we can continue to provide
the most competitive, high throughput, die-to-database inspection
solutions for our most advanced customers.”
“Applied Materials’ decision to implement OASIS.MASK in their
products shows the value of OASIS mask data format,” said Joseph
Sawicki, vice president and general manager for the
Design-to-Silicon division at Mentor Graphics. “Mentor’s experience
with OASIS goes back to the development of the original OASIS
format (SEMI standard P39), so incorporating our technology into
Aera2 was a logical extension of our product efforts. The use of
OASIS.MASK for mask manufacturing is fully supported by the
Calibre® platform in the Calibre FRACTUREv™, Calibre MDPverify™,
and Calibre MDPview™ products, which are all available today.”
Applied and Mentor will showcase their pioneering deployment of
OASIS.MASK in a production environment at SPIE Photomask 2009, the
mask-making industry’s premier technical symposium, to be held
September 14-17 in Monterey, California.
Applied Materials, Inc. (NASDAQ:AMAT) is the global
leader in Nanomanufacturing Technology™ solutions with a broad
portfolio of innovative equipment, service and software products
for the fabrication of semiconductor chips, flat panel displays,
solar photovoltaic cells, flexible electronics and energy efficient
glass. At Applied Materials, we apply Nanomanufacturing Technology
to improve the way people live. Learn more at
www.appliedmaterials.com.
Mentor Graphics Corporation (NASDAQ:MENT) is a world
leader in electronic hardware and software design solutions,
providing products, consulting services and award-winning support
for the world’s most successful electronics and semiconductor
companies. Established in 1981, the company reported revenues over
the last 12 months of about $800 million and employs approximately
4,425 people worldwide. Corporate headquarters are located at 8005
S.W. Boeckman Road, Wilsonville, Oregon 97070-7777. World Wide Web
site: http://www.mentor.com/.
(Mentor Graphics and Calibre are registered trademarks and
FRACTUREv, MDPview and MDPverify are trademarks of Mentor Graphics
Corporation. Applied Materials is a registered trademark and Aera2
is a trademark of Applied Materials. All other company or product
names are the registered trademarks or trademarks of their
respective owners.)
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