Mentor Graphics Corporation (Nasdaq:MENT) today announced that Taiwan Semiconductor Manufacturing Company Ltd. (TSMC) has selected Mentor๏ฟฝs Eldo๏ฟฝ analog simulation tool to characterize cells in its 40 nanometer (nm) standard cell libraries. ๏ฟฝTSMC is committed to offering high quality, silicon-proven standard cell libraries to enable customers to design at 40nm technologies,๏ฟฝ said ST Juang, senior director of design infrastructure marketing division, TSMC. ๏ฟฝBy adopting Eldo as our characterization SPICE engine, we are confident that we can deliver to this commitment.๏ฟฝ Advanced process technologies require that more process corners be characterized for each cell to accurately represent the process variation and physical effects on the design. More cell variants are also needed to accommodate different design considerations, such as cells for low power and cells for high speed. These advanced process technology requirements result in increased run time that must be mitigated by high performance SPICE simulation for library characterization. ๏ฟฝTSMC is the technology leader in advanced process technology so clearly Eldo๏ฟฝs role as TSMC๏ฟฝs simulator for 40nm standard cell characterization is an important one,๏ฟฝ said Jue-Hsien Chern, vice president and general manager, Deep Submicron Division at Mentor. About Mentor Graphics Mentor Graphics Corporation (NASDAQ:MENT) is a world leader in electronic hardware and software design solutions, providing products, consulting services and award-winning support for the world๏ฟฝs most successful electronics and semiconductor companies. Established in 1981, the company reported revenues over the last 12 months of over $850 million and employs approximately 4,200๏ฟฝpeople worldwide. Corporate headquarters are located at 8005 S.W. Boeckman Road, Wilsonville, Oregon 97070-7777. World Wide Web site: http://www.mentor.com/. Mentor Graphics and Eldo are registered trademarks of Mentor Graphics Corporation. All other company or product names are the registered trademarks or trademarks of their respective owners.
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