Mentor Graphics Calibre xRC and Calibre xL Tools Validated for TSMC 65 Nanometer Process Technology
14 12์ 2006 - 11:00PM
Business Wire
Mentor Graphics Corporation (Nasdaq:MENT) today announced the
availability of Calibre๏ฟฝ xRC๏ฟฝ and Calibre xL rule decks for TSMC๏ฟฝs
advanced 65nm process node. These rule decks provide advanced
modeling capabilities including process sensitivity, and self and
mutual induction models. Calibre now provides a solution for many
types of integrated circuit designs including analog, digital,
mixed signal, and memory. For nanometer designs, accurate
simulation and analysis requires more than traditional resistance
and capacitance. Designers need a post-layout silicon model that
incorporates inductance, process sensitivity effects, and efficient
accounting of effects not captured in the device model. Using
Calibre xRC and Calibre xL in the design flow helps ensure that
designers have all the data they need to obtain successful first
pass silicon. ๏ฟฝWe have developed testing methodology for parasitic
extraction tools to make sure we deliver accurate solutions to our
customers. Calibre xRC and Calibre xL performed well in our
internal tests and offer advanced modeling capabilities to capture
process variation effects that are necessary for 65nm,๏ฟฝ said Ed
Wan, senior director of design services marketing, TSMC.
๏ฟฝDelivering accurate, complete parasitic models is an integral part
of Calibre๏ฟฝs overall objective to improve silicon yield,๏ฟฝ said Joe
Sawicki, vice president and general manager, Design to Silicon
Division, Mentor Graphics. ๏ฟฝWhen coupled with Calibre LVS for
device modeling, Calibre xRC and Calibre xL help designers address
parametric yield issues by accurately capturing process variation
effects in device and interconnect models. Additionally, customers
now have access to a full complement of inductance models with
self, mutual and skin effect modeling that is necessary for today๏ฟฝs
high frequency interconnect.๏ฟฝ Enabling Accurate Post-Layout
Functional Verification: The New Nanometer Silicon Model Shrinking
geometries and increasing design size in the nanometer era have
enabled greater functionality on a single chip. But with the
increased functionality comes new complexities that create more
problems in the attempt to attain design closure. This requires an
electrical representation of the chip that accounts for the actual
physical design of its devices and interconnect, and accurate
silicon model. Calibre xRC and Calibre xL meet the demands of
nanometer designs with a comprehensive approach to device and
parasitic extraction to compose accurate silicon models enabling a
large variety of post-layout analyses. About Mentor Graphics Mentor
Graphics Corporation (Nasdaq:MENT) is a world leader in electronic
hardware and software design solutions, providing products,
consulting services and award-winning support for the world๏ฟฝs most
successful electronics and semiconductor companies. Established in
1981, the company reported revenues over the last 12 months of over
$750 million and employs approximately 4,100 people worldwide.
Corporate headquarters are located at 8005 S.W. Boeckman Road,
Wilsonville, Oregon 97070-7777. World Wide Web site:
http://www.mentor.com/. Mentor Graphics and Calibre are registered
trademarks and xRC is a trademark of Mentor Graphics Corporation.
All other company or product names are the registered trademarks or
trademarks of their respective owners.
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