Mentor Graphics and JEOL to Develop Advanced IC Mask Writing Solutions
23 11월 2011 - 11:00PM
Business Wire
Mentor Graphics Corporation (NASDAQ:MENT) and JEOL Ltd. today
announced an agreement to collaborate on integrated hardware and
software solutions for advanced IC mask writing. The companies are
currently engaged in a research program to demonstrate the
feasibility of an innovation called multi-resolution writing for
shot count reduction of up to 30% compared to the conventional
writing technique, dramatically reducing mask writing time. The new
agreement is focused on developing this technology as well as
providing optimized interfaces between the Mentor® mask data
preparation and mask process correction (MPC) software and JEOL
e-beam lithography equipment.
“Our customers have already seen the benefits of our work with
Mentor Graphics on improvements in mask quality and faster mask
write times at advanced nodes,” said Wataru Wakamiya, corporate
officer and general manager of the Semiconductor Business Unit at
JEOL. “Mentor is an industry leader in optical proximity
correction, mask data preparation, and mask process correction, so
we are happy to announce the formal extension of our long and
successful working relationship.”
“Over the years our collaboration has resulted in significant
innovations and reliable solutions for our mutual customers, and
this agreement will help to maintain the alignment between Mentor
software and JEOL hardware as both our product lines evolve to
handle new technology nodes,” said Joseph Sawicki, vice president
and general manager of the Mentor Design to Silicon division. “We
look forward to working with JEOL to solve the significant
challenges of advanced IC manufacturing.”
The new multi-resolution writing work is enabling patterns
“shot” onto the mask blank to alternate between detailed and
simplified versions for each pass in a multi-pass, vector e-beam
writing system, saving mask writing time. The Mentor mask process
correction software helps ensure the correct image is ultimately
printed from the sum of exposures. Previously, Mentor and JEOL
worked jointly on developing solutions to correct process effects
associated with 50 keV ebeam mask writing and on demonstration of
the dose encoding algorithm used within the JEOL data
specification.
The new agreement collaboration covers the full Mentor Calibre®
mask data prep product line, and the JEOL JBX-3200MV, JBX-30XXMV
and JBX-9000MV mask writer series products. Customers use Mentor
software to correct for process variations to improve the fidelity
of the final mask pattern and to verify mask data. JEOL also uses
Mentor tools to explore innovations during research and
development, to verify new product features and to assist in
customer support.
About Mentor Graphics
Mentor Graphics Corporation (NASDAQ:MENT) is a world leader in
electronic hardware and software design solutions, providing
products, consulting services and award-winning support for the
world’s most successful electronic, semiconductor and systems
companies. Established in 1981, the company reported revenues in
the last fiscal year of about $915 million. Corporate headquarters
are located at 8005 S.W. Boeckman Road, Wilsonville, Oregon,
97070-7777. World Wide Web site: http://www.mentor.com/.
(Mentor Graphics, Mentor and Calibre are registered trademarks
of Mentor Graphics Corporation. All other company or product names
are the registered trademarks or trademarks of their respective
owners.)
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