Mentor Graphics Completes 28nm Physical Design and Verification Flow for GLOBALFOUNDRIES Technology
03 6월 2011 - 10:00PM
Business Wire
Mentor Graphics Corporation (NASDAQ: MENT) today announced it
has completed its 28nm signoff-ready digital design flow for
GLOBALFOUNDRIES technology. The sign-off-ready design flow is
precisely tuned to address the unique challenges of designing and
manufacturing integrated circuits at leading-edge nodes. The
Olympus-SoC™ place and route system includes expanded low-power
features, improved recipes for efficient routing at 28nm, and DFM
support for the foundry’s manufacturing scoring analysis (MAS)
technique. The Calibre® platform provides advanced pattern matching
technology that implements GLOBALFOUNDRIES’ DRC+ methodology for
elimination of litho hotspots. The Calibre InRoute™ solution
provides the Calibre signoff analysis and automated repair
integrated in the Olympus-SoC physical design system.
“GLOBALFOUNDRIES’ 28nm technology and methodologies tuned with
Mentor’s tools offer our customers a powerful solution to drive
better yield and faster time to market,” said Andy Brotman, vice
president of design infrastructure at GLOBALFOUNDRIES. “These
advanced solutions—especially with the integration of our DRC+
pattern-matching technology—help ensure that designs using our 28nm
technologies perform and yield well without lengthy delays in the
design cycle to achieve manufacturing closure.”
Mentor® provides a complete reference flow based on the
Olympus-SoC place and route system and the Calibre physical
verification and DFM platform. New capabilities in the Olympus-SoC
product make it ready for GLOBALFOUNDRIES’ most advanced processes
including improved recipes for efficient routing with support for
advanced 28nm ground rules to implement DFM, support for
manufacturing scoring analysis (MAS), stage-based on-chip variation
(OCV) tables for clock and data paths, and context-dependent
timing, power and placement. In addition, the Olympus-SoC product
supports low power design with UPF-based IP models, advanced nested
voltage islands (donut shapes), and multi-vendor UPF
interoperability.
The Mentor reference flow fully supports GLOBALFOUNDRIES’ DRC+
methodology, which leverages the signoff-quality pattern matching
technology in the Calibre platform to deliver advanced litho
checking that is over 100 times faster than traditional flows. The
flow also includes the Calibre InRoute manufacturing closure
platform, which enables designers to natively invoke Calibre tools
within the Olympus-SoC place and route system to achieve true
manufacturing closure during physical design. The Calibre InRoute
platform provides customers with GLOBALFOUNDRIES-certified DRC+
fixing, which implements true correct-by-construction design by
recognizing and eliminating restricted layout patterns that can
cause DRC/DFM violations.
Also in the area of DFM, GLOBALFOUNDRIES has released its
Manufacturing Analysis and Scoring (MAS) deck for the Calibre
platform. MAS is a third-generation deck designed to bridge the gap
between DFM rules and models. It uses the unique Calibre
equation-based DRC (eqDRC) capability to score the
manufacturability of a layout using an easy-to-understand metric.
Using MAS, companies can provide DFM guidelines with a go/no go cut
line to their designers and IP providers, helping to reduce
manufacturability surprises at final tape out.
"The integration of Olympus, Calibre and GLOBALFOUNDRIES
technology into a seamless flow, including optimization for
advanced DFM effects, helps ensure signoff-ready results without
the iterations and rework often required to achieve manufacturing
closure," said Joseph Sawicki, vice president and general manager
of Mentor's Design-to-Silicon Division. “The Mentor reference flow
helps mutual customers fully leverage 28nm process capabilities,
yet still maintain or reduce design cycle times."
About Mentor Graphics
Mentor Graphics Corporation (NASDAQ: MENT) is a world leader in
electronic hardware and software design solutions, providing
products, consulting services and award-winning support for the
world’s most successful electronic, semiconductor and systems
companies. Established in 1981, the company reported revenues over
the last 12 months of about $915 million. Corporate headquarters
are located at 8005 S.W. Boeckman Road, Wilsonville, Oregon
97070-7777. World Wide Web site: http://www.mentor.com/.
(Mentor, Mentor Graphics and Calibre are registered trademarks
and Olympus-SoC and InRoute are trademarks of Mentor Graphics
Corporation. All other company and/or product names are the
trademarks and/or registered trademarks of their respective
owners).
Mentor Graphics Corp. (NASDAQ:MENT)
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