Mentor Graphics and NuFlare Technology Extend Collaboration to Address Advanced Maskwriting Challenges
20 9월 2011 - 7:00PM
Business Wire
Mentor Graphics Corporation (Nasdaq:MENT) and NuFlare
Technology, Inc. (Jasdaq:6256) today announced the extension of
their successful collaboration on integrated hardware and software
solutions for advanced IC mask generation. The companies’ new joint
marketing and support agreement will help ensure seamless
interfaces, high mask fidelity, fast mask writing times, and very
high levels of technical support.
The new agreement covers the Mentor Graphics® Calibre®
FRACTUREt™, Calibre FRACTUREv™, Calibre MDPmerge™, Calibre
MDPverify™, Calibre nmMPC and Calibre MDPview™ products. These are
used with NuFlare mask writers starting with the EBM-3000, all the
way up to the EBM-8000 series, and are being expanded for future
generation machines to perform data preparation, process correction
and verification of mask data to improve the fidelity of the final
mask pattern. NuFlare will also use Mentor tools to explore
innovations during research and development, to verify new product
features, and to assist in customer support. Past efforts between
Mentor and NuFlare have resulted in the definition of an OASIS.MASK
input interface and the definition of format extensions to carry
dose annotation for advanced mask writing on future generation
tools.
“Mentor is the recognized industry leader in OPC, MDP and MPC,
and has proven to be a reliable and innovative strategic partner
during our longstanding collaboration to date,” said Kiyoshi
Hattori, director and general manager of NuFlare's Mask Lithography
Engineering department. “Our engagement has delivered many benefits
for our mutual customers in OASIS.MASK support, mask process
correction advances, and mask write time reduction techniques.”
“We’re very pleased to extend our relationship with NuFlare, an
acknowledged leader in mask writing equipment. Our close
cooperation has provided many technology and service benefits to
our mutual customers,” said Joseph Sawicki, vice president and
general manager of the Mentor Design to Silicon division. “We look
forward to tackling the significant challenges of advanced IC
manufacturing together as we push beyond the historical limits of
IC scaling.”
About Mentor Graphics
Mentor Graphics Corporation (NASDAQ:MENT) is a world leader in
electronic hardware and software design solutions, providing
products, consulting services and award-winning support for the
world’s most successful electronic, semiconductor and systems
companies. Established in 1981, the company reported revenues over
the last 12 months of about $915 million. Corporate headquarters
are located at 8005 S.W. Boeckman Road, Wilsonville, Oregon
97070-7777. World Wide Web site: http://www.mentor.com/.
About NuFlare Technology, Inc.
NuFlare Technology, Inc. (JASDAQ:6256) is a supplier of mask
writing systems, mask inspection systems, and epitaxial reactor
systems. NuFlare has the world’s top market share in e-beam mask
writing systems and is a technology leader in mask writing systems
with its production, R&D and support sites in Japan, USA,
Germany, Korea and Taiwan. In fiscal year 2010/2011, NuFlare
Technology, Inc. generated consolidated revenues of over JPY 30
billion. Headquarters are located at Shin-Yokohama Business Center
Bldg. 10F, 3-2-6, Shin-Yokohama, Kohoku-ku, Yokohama, Kanagawa,
Japan 222-0033. World Wide Web site: http://www.nuflare.co.jp.
(Mentor Graphics, Mentor and Calibre are registered trademarks,
and FRACTUREt, FRACTUREv, MDPmerge, MDPverify and MDPview are
trademarks of Mentor Graphics Corporation. All other company or
product names are the registered trademarks or trademarks of their
respective owners.)
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