Mentor Graphics Design-to-Silicon Solutions Implemented as Part of Samsung Electronics' New 32nm High-K Metal Gate Offering
11 6월 2010 - 10:00PM
Marketwired
Mentor Graphics Corporation (NASDAQ: MENT) today announced that the
low-power 32nm Hi-K Metal Gate (HKMG) offering from Samsung
Electronics Foundry business (Samsung Foundry) includes Mentor
Graphics Calibre® design-to-silicon solutions as critical
components for both design and manufacturing. Mentor Calibre OPC
and Calibre Mask Data Prep products are used in the manufacturing
flow, while Calibre Physical Verification and DFM products are part
of Samsung Foundry's supported design flow.
"Mentor and Samsung have been collaborating for years on the
development and successful deployment of Calibre platform
capabilities for both design and manufacturing enablement that
provide cost and productivity efficiencies benefiting both Samsung
and their foundry customers," said Dr. KM Choi, vice president,
System LSI Design Technology, Samsung Electronics. "The benefits of
our collaboration and commitment to partnership can be seen in the
timely availability of a comprehensive design-to-silicon solution
enabling 32nm HKMG technology to be successfully utilized by the
fabless design community."
Samsung Foundry and Mentor are providing a comprehensive set of
capabilities for gate-first 32 nm HKMG designs based on the
industry leading Calibre platform, which is the primary signoff
environment for Common Platform technologies. The Mentor solution
for Samsung Foundry 32 nm HKMG includes Calibre nmDRC and nmLVS for
physical verification, Calibre LFD™ for litho variability checking,
and Calibre YieldAnalyzer, YieldEnhancer for DFM. Calibre OPC and
mask data preparation tools are deployed in the mask data prep
flow, enabling accurate litho simulation and correction
capabilities and providing fast mask turnaround times.
The Samsung Foundry-Calibre solution is more than a standard
foundry reference flow because the joint solution is also used by
Samsung System LSI designers in the creation of some of the most
advanced high volume products in the industry. The overall flow and
the Samsung design kits are constantly validated and updated by
Samsung internally so that mutual customers can count on a
silicon-proven design flow. Moreover, using the complete Calibre
DFM platform and the robust design kits that are part of the
Samsung 32nm offering, mutual customers can tune their designs to
achieve smoother design ramps at Samsung.
"Samsung is an innovative partner that has helped Mentor
continuously extend the Calibre platform to achieve rapid
technology development cycle times and industry leading design and
manufacturing results," said Joseph Sawicki, vice president and
general manager of the Design-to-Silicon Division at Mentor
Graphics. "Our collaboration in design verification, computational
lithography and the mask production flow has produced a
comprehensive capability for successful design-to-manufacturing
handoff. The result is both time-to-market and yield benefits for
design companies that take advantage of this new Samsung process
technology."
About Mentor Graphics Mentor Graphics
Corporation (NASDAQ: MENT) is a world leader in electronic hardware
and software design solutions, providing products, consulting
services and award-winning support for the world's most successful
electronics and semiconductor companies. Established in 1981, the
company reported revenues over the last 12 months of about $800
million. Corporate headquarters are located at 8005 S.W. Boeckman
Road, Wilsonville, Oregon 97070-7777. World Wide Web site:
http://www.mentor.com/.
(Mentor Graphics and Calibre are registered trademarks and LFD
is a trademark of Mentor Graphics Corporation. All other company or
product names are the registered trademarks or trademarks of their
respective owners).
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For more information, please contact: Gene Forte Mentor Graphics
503.685.1193 gene_forte@mentor.com Sonia Harrison Mentor Graphics
503.685.1165 sonia_harrison@mentor.com
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