Selete Selects Mentor Graphics Calibre nm Platform for EUV Flare Compensation
27 2월 2009 - 11:00PM
Business Wire
Mentor Graphics Corporation (NASDAQ: MENT) today announced that
Semiconductor Leading Edge Technologies, Inc. (Selete) has selected
the Calibre� nm Platform for simulation and correction of flare in
its Extreme UV Lithography (EUV) research program for memory and
logic ICs.
�We have conducted exhaustive experiments and have verified that
the Calibre platform�s flare modeling capability accurately models
and corrects for the strong flare effects in EUV," said Ichiro
Mori, Director and General Manager, Research Department 3, Selete.
�This level of accuracy, combined with the Calibre platform's high
performance and reliability, makes it the best alternative for use
in full chip-level evaluation on a process liability test site in
our EUV research program.�
EUV Lithography is one of the strong candidates for production
of integrated circuits below 22nm. EUV exposure systems utilize a
13.5nm wavelength illumination source to enable printing of feature
sizes expected at future nodes. However, EUV exposure systems
suffer from a very high level of scattered light known as �flare.�
The expected flare levels will create unacceptably large
distortions in printed features, leading to degraded circuit
performance if not properly compensated.
The Calibre hierarchical polygon processing engine with its
�Density Convolve� capability simulates the level of scattered
light at all points within the chip utilizing fractal kernel
convolution models, and then compensates for the scattered light�s
effect on the printed image. Teams of researchers from Selete and
Mentor Graphics have validated the accuracy and performance of the
Calibre flare compensation flow at Selete.
�We are extremely pleased that Mentor has been chosen as
Selete�s EDA vendor of choice for partnering on solutions for EUV
mask development,� said Joseph Sawicki, vice president and general
manager for the design-to-silicon division at Mentor Graphics. �We
have a very strong partnership with Selete that has already
resulted in significant successes on the Calibre nm Platform. We�re
looking forward to extending our research as we continue to meet
the critical need for pattern fidelity at new semiconductor
nodes.�
About Mentor Graphics
Mentor Graphics Corporation (NASDAQ: MENT) is a world leader in
electronic hardware and software design solutions, providing
products, consulting services and award-winning support for the
world�s most successful electronics and semiconductor companies.
Established in 1981, the company reported revenues over the last 12
months of about $800 million and employs approximately 4,500 people
worldwide. Corporate headquarters are located at 8005 S.W. Boeckman
Road, Wilsonville, Oregon 97070-7777. World Wide Web site:
http://www.mentor.com/.
(Mentor Graphics and Calibre are registered trademarks of Mentor
Graphics Corporation. All other company or product names are the
registered trademarks or trademarks of their respective
owners.)
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