Mentor Graphics' DFM Solution Qualified by Common Platform Technology Alliance for 45nm and 65nm
04 6월 2007 - 10:00PM
Business Wire
Mentor Graphics Corporation (Nasdaq:MENT) today announced that the
Common Platform Technology alliance � IBM, Chartered and Samsung �
have qualified the Calibre� suite of DFM tools used by designers to
make physical designs less sensitive to yield loss due to particle
contaminants and systematic process variability. The collaboration
between Mentor Graphics and the Common Platform foundries provides
an integrated DFM solution to address both random and systematic
yield limiters for 65nm and 45nm processes. �The Common Platform
Alliance and Mentor Graphics have worked together to develop
Calibre CAA and CFA production decks and qualify these flows for
both our 65nm and 45nm process technologies,� said Walter Ng,
senior director of platform alliances for Chartered. �As the first
foundries to provide an integrated solution for CAA and CFA, we see
the value in enabling designers to consider both issues in making
physical design improvement decisions.� The new DFM flow uses
Mentor�s Calibre YieldAnalyzer to perform critical area analysis
(CAA) on all base and interconnect layers of a design. CAA
identifies those areas of an integrated circuit layout with higher
than average vulnerability to random particle defects that can
create a short or open in areas with close spacing of layout
features. Calibre YieldAnalyzer also performs critical feature
analysis (CFA), a flexible extension to traditional recommend rules
analysis. YieldAnalyzer employs a model-based approach that
automatically plugs layout measurements into yield-related
equations to identify areas of a physical design that have higher
sensitivity to variations across the manufacturing process window.
YieldAnalyzer then presents the resulting data to designers in
easy-to-understand charts and graphs. For example, CFA analysis
identifies potential �hot spots� due to a variety of systematic
issues that increase process variability, including lithography,
CMP, resist stability, and etch process characteristics.
YieldAnalyzer provides specific guidance to help the designer
quickly locate and prioritize these hot spots and determine what
layout changes will result in the greatest yield improvement.
Analysis approaches that consider these effects in isolation can
report misleading results and direct designers to make layout
modifications that appear to improve manufacturability, but are
found to reduce it in the context of a broader set of yield
limiters. By integrating random (CAA) and systematic (CFA) process
analysis, the Calibre nm Platform accounts for the combined impact
of these effects on design manufacturability and enables designers
to prioritize and guide manufacturability improvement in light of a
wide spectrum of yield limiters. Calibre YieldAnalyzer�s
model-based CAA/CFA methodology complements the Calibre LFD�
litho-friendly design solution qualified for Common Platform
customers last year. Calibre LFD provides the ability to run
simulations to see how a layout will print under a particular
lithographic process window. Calibre LFD allows designers to
achieve an �LFD clean� as well as a �DRC clean� sign-off to ensure
high yields for advanced process nodes. �Mentor is continuing to
extend the Calibre nm Platform to address all the needs of physical
verification, DFM and post-tapeout physical design improvement,�
said Joe Sawicki, vice president and general manager, Design to
Silicon Division, Mentor Graphics. �We are investing heavily to
ensure that our platform and tools are tightly integrated with each
other and all major design environments, so users can have the
flexibility to create optimum DFM flows while protecting their
existing EDA investment.� About Mentor Graphics Mentor Graphics
Corporation (Nasdaq: MENT) is a world leader in electronic hardware
and software design solutions, providing products, consulting
services and award-winning support for the world�s most successful
electronics and semiconductor companies. Established in 1981, the
company reported revenues over the last 12 months of about $800
million and employs approximately 4,250 people worldwide. Corporate
headquarters are located at 8005 S.W. Boeckman Road, Wilsonville,
Oregon 97070-7777. World Wide Web site: http://www.mentor.com/.
(Mentor Graphics and Calibre are registered trademarks of Mentor
Graphics Corporation. All other company or product names are the
registered trademarks or trademarks of their respective owners.)
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