UMC Expands Support for Mentor Graphics' Calibre YieldAnalyzer to Deliver Production Proven DFM Flow
15 5월 2007 - 10:00PM
Business Wire
Mentor Graphics Corporation (Nasdaq:MENT) today announced that UMC
has expanded its support for the Calibre� nm Platform with Calibre
YieldAnalyzer� for all major design flows for its 90 nanometer (nm)
and 65nm processes. Mentor and UMC have worked collaboratively to
introduce Design for Manufacturing (DFM) capabilities that give
designers highly valuable information to guide physical design
improvements that can increase production yields. As volume IC
production moves to sub-100nm, manufacturing costs increase
dramatically and yield is increasingly sensitive to both random and
systematic defects and process variations. Calibre YieldAnalyzer
can mitigate one source of yield loss by performing critical area
analysis (CAA), providing information about how random process
defects, such as unwanted particles, result in layout pattern
shorts and opens that reduce yield. Designers can use CAA
information to modify layouts to reduce the probability of
incurring these failures in production. The DFM collaboration
between Mentor Graphics and UMC started in 2005 with the creation
of production decks to enable Mentor�s Calibre YieldEnhancer� for
UMC�s 180nm through 65nm processes. YieldEnhancer reduces
systematic defects with a variety of pattern enhancements, such as
inserting redundant �Vias� and other techniques to improve as-built
circuit integrity. YieldEnhancer production decks, as well as the
new silicon verified decks for Calibre YieldAnalyzer users, are
available upon request through UMC customer representatives. �Our
long-term relationship makes Mentor Graphics a natural choice as an
ongoing EDA partner for CAA,� said Patrick Lin, Chief SoC
Architect, System and Architecture Support at UMC. �We have found
that the Calibre YieldAnalyzer tool produces results with excellent
correlation to our internal data standard. This work complements
our existing Calibre YieldEnhancer Via-doubling decks that also
provide excellent coverage and outstanding throughput performance
for layout enhancement. We believe our support for Calibre�s DFM
tools provides a valuable advantage for our mutual customers.�
�YieldAnalyzer and YieldEnhancer are just two components of the
expanding Calibre nm Platform first introduced a year ago with
nmDRC,� said Joe Sawicki, vice president and general manager of the
Design-to-Silicon division at Mentor Graphics. �Building on our
powerful, production-proven Hyperscaling architecture, we are
delivering the broadest, most accurate, and best performing DFM
solutions in the industry. Because the Calibre platform is built on
standard open database interfaces, it brings production proven DFM
capabilities to UMC customers, independent of the design creation
environment they use.� About the Calibre DFM Platform Mentor
Graphics offers a full range of DFM analysis and enhancement
solutions for random, systematic, and parametric process issues
affecting production yield. Calibre nmDRC is the industry standard
for physical verification, with Hyperscaling technology that
supports simultaneous execution on up to 100 CPUs for dramatically
improved runtimes. Calibre LVS is the market-leading layout vs.
schematic physical verification tool, which extracts the most
advanced device properties from state-of-the-art device models.
Calibre xRC� and xL parasitic extraction tools deliver accurate
interconnect models, and their hierarchical structure provides
breakthrough performance even for very large designs. Calibre
YieldAnalyzer combines critical area analysis (CAA) and critical
feature analysis (CFA) into a single integrated solution.
YieldEnhancer recommends and performs specific layout
modifications, such as via doubling, via extensions and enclosures,
to increase production yield. Calibre LFD� addresses issues related
to lithographic process effects by modeling the effects of process
variability on both devices and interconnects, and identifying
layout �hot spots� that can be improved to ensure higher yield.
Calibre nmOPC, OPCpro�, OPCverify� and other related tools provide
a complete solution for layout resolution enhancement and mask data
preparation. Dense simulation, contour-based design intent
constraints, Cell Broadband Engine compatibility, and other
innovations allow the Calibre environment to deliver unprecedented
accuracy and performance at the lowest cost of ownership. About
Mentor Graphics Mentor Graphics Corporation (Nasdaq:MENT) is a
world leader in electronic hardware and software design solutions,
providing products, consulting services and award-winning support
for the world's most successful electronics and semiconductor
companies. Established in 1981, the company reported revenues over
the last 12 months of about $800 million and employs approximately
4,250 people worldwide. Corporate headquarters are located at 8005
S.W. Boeckman Road, Wilsonville, Oregon 97070-7777. World Wide Web
site: www.mentor.com. Mentor Graphics and Calibre are registered
trademarks and Calibre LFD, YieldEnhancer, YieldAnalyzer, Calibre
xRC, Calibre OPCpro and Calibre OPCverify are trademarks of Mentor
Graphics Corporation. All other company or product names are the
registered trademarks or trademarks of their respective owners.
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