Mentor Graphics Releases Next-Generation OPC Solution
30 11월 2006 - 3:00AM
Business Wire
Mentor Graphics Corporation (NASDAQ:MENT) today announced
availability of Calibre� nmOPC, a third-generation optical
proximity correction (OPC) tool that expands the Calibre arsenal of
resolution enhancement technology (RET) products for sub-65
nanometer (nm) process technologies. The Calibre nmOPC tool and the
companion OPC verification tool, Calibre OPCverify� (announced
earlier this year), usher in a new era of computational lithography
by delivering superior simulation accuracy with the highest
performance and lowest cost of ownership in the industry. Low k1
photolithography processes are increasing the complexity of RET
applications in nanometer designs. At 45nm, more complex models and
through process window correction and verification requirements
significantly increase computational burden. Both the lithographic
challenges and the computational complexity associated with the
45nm process node create a need for advanced capabilities for
computational lithography tools. Calibre nmOPC answers these
challenges by delivering several innovations including dense
simulation, process window optimized OPC, a hybrid computing
platform utilizing co-processor acceleration (with the Cell BE
processor), a new compact resist process modeling capability, and
design-intent aware correction algorithms. The Calibre nmOPC tool
offers best-in-class accuracy, speed, and cost of ownership. Like
all Calibre family products, Calibre nmOPC and Calibre OPCverify
run on the fully integrated Calibre hierarchical geometry engine
uniquely enabling a fully integrated design to mask flow with a
unified command language. Calibre nmOPC also delivers many
practical production features such as: OASIS formatting to minimize
output file size; new streamlined hierarchical processing to
improve run time and file size compared to flat OPC tools, a
progress meter and dynamic CPU allocation capability to manage TAT
in a production environment. Dense, Process-window Simulation
Process variability can have a dramatic effect on yield. This is
especially true in the lithographic process where dose and focus
variability impacts image fidelity. To reduce the risk of silicon
failure and enable acceptable yield under challenging low k1
conditions, Calibre nmOPC uses both dense simulation capabilities,
which provide 100 percent simulation coverage for the mask layer,
and process window correction optimization algorithms to ensure
silicon-patterning success. Calibre nmOPC also features multi-layer
inputs into the correction algorithm to enable design critical
features to be patterned to preserve design intent and parametric
yield. Hybrid CoProcessor Computing Platform Mentor addresses the
rising cost of ownership associated with the geometrically
increasing need for more CPUs by introducing a unique CoProcessor
Architecture. The Remote Acceleration Simulation (RAS) architecture
elegantly enables the option of connecting a Coprocessor
Acceleration cluster with an Ethernet connection to an existing
compute cluster. Mentor has partnered with Mercury Computer
Systems, a leader in high performance computing system design, to
offer standard Coprocessor Acceleration clusters based on the
ultra-high performance Cell Broadband Engine� (CBE). The Cell
Processor clusters accelerate the image processing components of
Calibre nmOPC enabling 4 to 10X improvements in run time with
little to no increase in general purpose computing requirements
over the 65nm node. This innovative application of the Cell
Processor to computational lithography will reset cost of ownership
targets for the industry in line with customer requirements for
cost mitigation. According to Anthony Yu, Vice President,
Semiconductor Industry Sales, Technology Collaboration Solutions,
IBM Corporation, �Cell BE's order of magnitude performance
advantage for many types of image-based computing can make it a
great fit for semiconductor-related applications like Mentor's new
dense imaging software technology. Cell BE's deployment by an EDA
company like Mentor Graphics can put Cell BE at the forefront of
enabling advanced semiconductor processing.� Compact Modeling
Mentor continues its legacy of providing industry-leading modeling
accuracy and technology with the introduction of a new 4th
generation compact resist process model. The new CM1 model
demonstrates better accuracy than its predecessors, meeting
customer requirements for the 45 and 32 nm process generations, and
takes full advantage of the dense simulation capabilities of nmOPC
and coprocessor acceleration. The automated calibration process for
CM1 models yields excellent model stability and eliminates
difficult optimization choices for the OPC engineer. �With Calibre
nmOPC, we introduce several new technologies that enable us to
maintain our market leadership position in the computational
lithography market,� said Joe Sawicki, vice president and general
manager, Design to Silicon Division, Mentor Graphics. �And we have
retained our proven business model reinforcing our core
competencies in software innovation, while partnering with Mercury
to provide the high performance computing hardware.� Pricing and
Availability Calibre nmOPC is available immediately with a starting
price of $120K for a one-year term license. More information is
available at www.mentor.com or by calling 800-547-3000. About Cell
Broadband Engine Cell Broadband Engine is a trademark of Sony
Computer Entertainment, Inc. Cell BE is a collaborative development
by Sony, Toshiba and IBM. For more information about Cell Broadband
Engine technology, see
http://www-128.ibm.com/developerworks/power/cell/index.html About
Mentor Graphics Mentor Graphics Corporation (Nasdaq: MENT) is a
world leader in electronic hardware and software design solutions,
providing products, consulting services and award-winning support
for the world�s most successful electronics and semiconductor
companies. Established in 1981, the company reported revenues over
the last 12 months of about $750 million and employs approximately
4,100 people worldwide. Corporate headquarters are located at 8005
S.W. Boeckman Road, Wilsonville, Oregon 97070-7777. World Wide Web
site: http://www.mentor.com/. Mentor Graphics and Calibre are
registered trademarks and Calibre OPCverify is a trademark of
Mentor Graphics. All other company or product names are the
registered trademarks or trademarks of their respective owners.
Mentor Graphics Corporation (NASDAQ:MENT) today announced
availability of Calibre(R) nmOPC, a third-generation optical
proximity correction (OPC) tool that expands the Calibre arsenal of
resolution enhancement technology (RET) products for sub-65
nanometer (nm) process technologies. The Calibre nmOPC tool and the
companion OPC verification tool, Calibre OPCverify(TM) (announced
earlier this year), usher in a new era of computational lithography
by delivering superior simulation accuracy with the highest
performance and lowest cost of ownership in the industry. Low k1
photolithography processes are increasing the complexity of RET
applications in nanometer designs. At 45nm, more complex models and
through process window correction and verification requirements
significantly increase computational burden. Both the lithographic
challenges and the computational complexity associated with the
45nm process node create a need for advanced capabilities for
computational lithography tools. Calibre nmOPC answers these
challenges by delivering several innovations including dense
simulation, process window optimized OPC, a hybrid computing
platform utilizing co-processor acceleration (with the Cell BE
processor), a new compact resist process modeling capability, and
design-intent aware correction algorithms. The Calibre nmOPC tool
offers best-in-class accuracy, speed, and cost of ownership. Like
all Calibre family products, Calibre nmOPC and Calibre OPCverify
run on the fully integrated Calibre hierarchical geometry engine
uniquely enabling a fully integrated design to mask flow with a
unified command language. Calibre nmOPC also delivers many
practical production features such as: OASIS formatting to minimize
output file size; new streamlined hierarchical processing to
improve run time and file size compared to flat OPC tools, a
progress meter and dynamic CPU allocation capability to manage TAT
in a production environment. Dense, Process-window Simulation
Process variability can have a dramatic effect on yield. This is
especially true in the lithographic process where dose and focus
variability impacts image fidelity. To reduce the risk of silicon
failure and enable acceptable yield under challenging low k1
conditions, Calibre nmOPC uses both dense simulation capabilities,
which provide 100 percent simulation coverage for the mask layer,
and process window correction optimization algorithms to ensure
silicon-patterning success. Calibre nmOPC also features multi-layer
inputs into the correction algorithm to enable design critical
features to be patterned to preserve design intent and parametric
yield. Hybrid CoProcessor Computing Platform Mentor addresses the
rising cost of ownership associated with the geometrically
increasing need for more CPUs by introducing a unique CoProcessor
Architecture. The Remote Acceleration Simulation (RAS) architecture
elegantly enables the option of connecting a Coprocessor
Acceleration cluster with an Ethernet connection to an existing
compute cluster. Mentor has partnered with Mercury Computer
Systems, a leader in high performance computing system design, to
offer standard Coprocessor Acceleration clusters based on the
ultra-high performance Cell Broadband Engine(TM) (CBE). The Cell
Processor clusters accelerate the image processing components of
Calibre nmOPC enabling 4 to 10X improvements in run time with
little to no increase in general purpose computing requirements
over the 65nm node. This innovative application of the Cell
Processor to computational lithography will reset cost of ownership
targets for the industry in line with customer requirements for
cost mitigation. According to Anthony Yu, Vice President,
Semiconductor Industry Sales, Technology Collaboration Solutions,
IBM Corporation, "Cell BE's order of magnitude performance
advantage for many types of image-based computing can make it a
great fit for semiconductor-related applications like Mentor's new
dense imaging software technology. Cell BE's deployment by an EDA
company like Mentor Graphics can put Cell BE at the forefront of
enabling advanced semiconductor processing." Compact Modeling
Mentor continues its legacy of providing industry-leading modeling
accuracy and technology with the introduction of a new 4th
generation compact resist process model. The new CM1 model
demonstrates better accuracy than its predecessors, meeting
customer requirements for the 45 and 32 nm process generations, and
takes full advantage of the dense simulation capabilities of nmOPC
and coprocessor acceleration. The automated calibration process for
CM1 models yields excellent model stability and eliminates
difficult optimization choices for the OPC engineer. "With Calibre
nmOPC, we introduce several new technologies that enable us to
maintain our market leadership position in the computational
lithography market," said Joe Sawicki, vice president and general
manager, Design to Silicon Division, Mentor Graphics. "And we have
retained our proven business model reinforcing our core
competencies in software innovation, while partnering with Mercury
to provide the high performance computing hardware." Pricing and
Availability Calibre nmOPC is available immediately with a starting
price of $120K for a one-year term license. More information is
available at www.mentor.com or by calling 800-547-3000. About Cell
Broadband Engine Cell Broadband Engine is a trademark of Sony
Computer Entertainment, Inc. Cell BE is a collaborative development
by Sony, Toshiba and IBM. For more information about Cell Broadband
Engine technology, see
http://www-128.ibm.com/developerworks/power/cell/index.html About
Mentor Graphics Mentor Graphics Corporation (Nasdaq: MENT) is a
world leader in electronic hardware and software design solutions,
providing products, consulting services and award-winning support
for the world's most successful electronics and semiconductor
companies. Established in 1981, the company reported revenues over
the last 12 months of about $750 million and employs approximately
4,100 people worldwide. Corporate headquarters are located at 8005
S.W. Boeckman Road, Wilsonville, Oregon 97070-7777. World Wide Web
site: http://www.mentor.com/. Mentor Graphics and Calibre are
registered trademarks and Calibre OPCverify is a trademark of
Mentor Graphics. All other company or product names are the
registered trademarks or trademarks of their respective owners.
Mentor Graphics Corp. (NASDAQ:MENT)
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