Mentor Graphics Next-Generation OPC Technology Ensures Yield Across Manufacturing Process Window
09 1월 2006 - 11:00PM
Business Wire
Mentor Graphics Corporation (Nasdaq:MENT) today announced
availability of the Calibre(R) OPCverify tool. Calibre OPCverify
signals the beginning of a new generation of OPC technology, and
expands the design for manufacturing (DFM) solutions from Mentor.
Calibre OPCverify addresses the challenge of managing the impact of
"process variability" on yield. Process variability can have a
dramatic effect on yield. This is especially true in the
lithographic process where variability puts image fidelity at risk
even when the operating conditions of the lithographic system
(lithographic process window) are acceptable. To reduce the risk of
silicon failure, avoid costly respins and ensure acceptable yield,
Calibre OPCverify detects lithographic errors or marginalities
caused by process variability before the design goes to the mask or
wafer manufacturer. The increased complexity of resolution
enhancement technology (RET) at 65 nanometers is impacting
lithographic yield in several ways. The major contributors to
declining yields are: a smaller lithographic process window,
increased sensitivity to layout topology in the lithographic
process, and complex mask rule constraints that impact the
application of RET. These issues must be addressed with a fast,
accurate and easy-to-use RET verification solution that detects
yield-limiting conditions. Calibre OPCverify, which uses
silicon-proven simulation models from Calibre OPCpro, is the next
generation of RET verification, providing 100% simulation coverage
of the entire chip to ensure silicon-patterning success. The
Calibre OPCverify pixel-based simulation engine accounts for the
effects of process variability using patented algorithms that
define the conditions (dose, focus) that adversely impact pattern
transfer. All Calibre OPCverify modeling capabilities have been
thoroughly characterized for the most advanced process conditions
in production, including immersion lithography. The rigorous model
development and verification methodology used for the Calibre
OPCverify tool allows it to satisfy the stringent requirements for
both RET recipe validation and mask verification. The set-up and
configuration of Calibre OPCverify is enabled through a user
interface called the Calibre Verification Center. With Calibre
OPCverify and the Calibre Verification Center, a comprehensive and
accurate RET mask verification flow can be integrated seamlessly
into existing post-layout flows in less than 24 hours. Another
benefit of using Calibre OPCverify and the Calibre Verification
Center is that the tools take advantage of existing hardware in the
most optimized way possible. With the combination of high-speed
compute power available on today's workstations, and the concurrent
processing functionality in Calibre MTflex, very fast turnaround
times for full-chip RET verification can be achieved. Because of
the design-independent nature of the tool, users experience very
predictable runtimes and excellent scalability. While actual run
time is dependent on the hardware used, the Calibre OPCverify
terapixel simulator is scalable to hundreds of CPU's, and can
handle flat or hierarchical data. "Verification of post-OPC flow
output is critical to minimizing costly mask respins and
time-to-market delays," said Dr. Choi Byoung Il, OPC manager,
Technical Support Division, Technology Development at Chartered
Semiconductor Manufacturing. "Augmenting our existing pattern
transfer accuracy checking methods with a lithography process
window verification capability enhances our ability for early
identification of process-sensitive structures across the chip,
thereby improving the quality of OPC." "For 90nm and smaller
technology nodes, the complexity of OPC and the constraints that go
with it require verification to prevent silicon failures," said Joe
Sawicki, vice president and general manager for the
design-to-silicon division at Mentor Graphics. "Some customer
sources claim that 50% of all mask respins can be avoided by simply
verifying the OPC for the effects of process variability. Calibre
OPCverify yields a powerful return on investment through savings in
mask costs and more predictable yield." Pricing and Availability:
Calibre OPCverify and the Calibre Verification Center are available
immediately. Pricing starts at $80K. More information is available
at www.mentor.com or by calling 800-547-3000. About Mentor Graphics
Mentor Graphics Corporation (Nasdaq:MENT) is a world leader in
electronic hardware and software design solutions, providing
products, consulting services and award-winning support for the
world's most successful electronics and semiconductor companies.
Established in 1981, the company reported revenues over the last 12
months of about $700 million and employs approximately 3,950 people
worldwide. Corporate headquarters are located at 8005 S.W. Boeckman
Road, Wilsonville, Oregon 97070-7777. World Wide Web site:
http://www.mentor.com/. Mentor Graphics and Calibre are registered
trademarks of Mentor Graphics Corporation. All other company or
product names are the registered trademarks or trademarks of their
respective owners.
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